Hellma Materials CaF2 has been utilized as an optical key material in microlithography for semiconductor production for many years. CaF2 is established as an industry standard material for excimer laser optics in projection and illumination optics. The unique optical properties of CaF2 enable a variety of advanced applications.
Due to its superior optical quality and excellent transmittance in UV, VIS and IR spectral ranges, Hellma Materials CaF2 can be used in versatile applications:
Lithotec® CaF2 from Hellma Materials has unique optical properties: